Albany NanoTech Complex is set to become the site for a groundbreaking particle accelerator, thanks to a $150 million investment from the Trump administration. Palo Alto-based company xLight will spearhead the project, which aims to develop a next-generation light source for extreme ultraviolet (EUV) lithography. The construction of the facility, known as the NanoFab Reflection, is expected to be completed by June 2026, with the prototype operational by 2028.

The project is part of the larger CHIPS for America initiative, which seeks to bolster the United States' semiconductor industry. According to Times Union, the U.S. Commerce Department and xLight have signed a letter of intent that grants the government an equity stake in the company in exchange for the federal funding.

The new facility will house a high numerical aperture (NA) EUV lithography center, making it the first publicly-owned center of its kind in North America. This center will play a crucial role in advancing semiconductor research and development, as it will support the creation of more efficient and powerful microchips. The project has garnered significant private investment from industry leaders such as IBM, Micron, Applied Materials, and Tokyo Electron.

Governor Kathy Hochul announced the grand opening of the CHIPS for America EUV Accelerator at the Albany NanoTech Complex, highlighting the state's commitment to becoming a leader in semiconductor technology. Governor Hochul stated, "This launch is only the beginning" of New York's leadership in tech innovation.

Despite uncertainties surrounding federal funding, xLight remains optimistic about the project. xLight CEO Nicholas Kelez expressed enthusiasm for the partnership with Albany NanoTech, emphasizing the potential for groundbreaking advancements in EUV lithography.

Christa Cooper